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and light irradiation. The activities planned during the postdoctoral fellowship include: - heavily boron-doped silicon (Si:B) thin film epitaxial growth using nanosecond laser doping within the EPLA
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dynamics simulations to understand the growth mechanisms of thin films deposited by magnetron sputtering, with or without ion beam assistance (IBAS), particularly for metallic materials (Ag) and oxides (ZnO
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characterization of new thermometry concepts for ultra-low-temperature applications; • the implementation, optimization, and operation of thin film deposition systems; • thin film deposition and characterization
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. Physicochemical characterization of the modified surfaces using the techniques available in the laboratory, including electron microscopy, surface spectroscopies, and thin-film analysis methods. Analysis
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systems will be highly appreciated. The candidate should also have knowledge of microfluidics and/or organ-on-chip technologies, as well as hands-on experience with at least one thin-film deposition