1 stem-education Postdoctoral positions at CNRS

Researcher(M/F) – Development of Plasma Etching Processes for III-V Lasers for Silicon Photonic Integration

CNRS | Grenoble, Rhone Alpes | France | 7 days ago

) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which