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is currently the main technological challenge, while achieving anisotropic laser sidewalls without lateral degradation of the quantum wells. Pulsed plasma technologies, known to improve etch
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on the ultra-stable laser stations of the REFIMEVE infrastructure. The research will focus on developing experimental methods to exploit REFIMEVE's photonic and metrological systems for innovative measurement
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Laser Doping or Pulsed Laser Induced Epitaxy, allowing the fabrication of ultra-doped Si:B layers, well above the B solubility limit in Si. The films will be characterized by X-Ray Diffraction
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19 Sep 2026 Job Information Organisation/Company CNRS Department Institut de physique et chimie des matériaux de Strasbourg Research Field Engineering Computer science Mathematics Researcher Profile
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design and vacuum technology. Electronics and instrumentation. Experience with laser systems and optical setups. Website for additional job details https://emploi.cnrs.fr/Offres/CDD/UMR8552-THIJAC-001