5 Science Postdoctoral positions at ARCNL

Postdoc: Imaging and metrology via ultra-thin optical fibers

on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research

Postdoc: Resolving Surface Reactions in Plasma Catalysis (SURPLAS)

. This postdoc position connects the two active research fields of surface science and plasma chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique

Postdoc: Machine learning for imaging and metrology

Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers of the Amsterdam Machine Learning Lab of UvAand researchers

Postdoc: Theory of the atomic origins of EUV light (project MOORELIGHT)

at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo

Postdoc: Efficient generation of EUV light from laser-driven plasma

at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo