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Materials Science (CMAT) is looking for: Doctoral researcher (PhD student) in area-selective atomic layer deposition (AS-ALD) simulations Are you interested in discovering and understanding chemical
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chemistry with engineering to produce a tangible impact. Your role and goals As a doctoral researcher, you will deposit thin film catalysts using primarily atomic layer deposition (ALD) and characterize them
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impact. Your role and goals As a doctoral researcher, you will deposit thin film catalysts using primarily atomic layer deposition (ALD) and characterize them physicochemically and electrochemically
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at Aix-Marseille University, where she will be granted student status. Boronization is a well-established technique in tokamak operation, involving the deposition of a thin boron layer on the inner
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, FCVD creates a liquid-like layer that fills narrow trenches on substrates before solidifying into films. We will model this across multiple scales, from atoms to fluid flow, using quantum chemistry