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in this field. C. Grouin will cover computer science aspects and automated language processing. We will also collaborate with Vincent Génot, former director of the Plasma Physics Data Center at IRAP in
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scientifically justified, to achieve superior joint integrity, metallurgical compatibility, and operational reliability in space. A central focus is the altered plasma and arc physics that arise in vacuum, where
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Warsaw University of Technology/Centre for Advanced Materials and Technologies, CEZAMAT | Poland | about 1 month ago
, lithography, plasma deposition, and thermal processes Development and execution of inter-process inspections, including scanning electron microscopy, optical microscopy, atomic force microscopy, ellipsometry
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Institute of Neuroscience and physiology, Sahlgrenska Academy, university of Gothenburg | Sweden | 15 days ago
University of Gothenburg can be found on the university's doctoral student pages. https://www.gu.se/en/doctoral-studies Duties The PhD education in Medical Science comprises carrying out a scientific project
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range of suspension-based processing methods, such as screen printing, plasma spraying, dip coating, and electrophoretic deposition Developing sintering processes for coated support structures under
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questions, we are happy to help. You will work on the greenest and most innovative campus in the Netherlands, in an international and open working environment. Selection process For more information about the
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: electrolysis, plasma, and direct reduction The role of multi-scale modelling in metallurgical processes and materials sustainability Characterisation techniques for materials: from atomistics to the meso-scale
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heliophysics), with a strong emphasis on experimental and observational space plasma physics. Among others, the Group currently leads NASA's Interstellar Boundary Explorer (IBEX) mission, the Parker Solar Probe
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measurements that will be coupled to on-line analytics (c.f. https://www.nature.com/articles/s41563-019-0555-5). Specifically, an in-house designed flow cell is coupled to inductively coupled plasma mass