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activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
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essential. Work environment ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor
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the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins
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