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its inverse reconstruction. A key challenge is the data-driven design of the experimental setup: exploring how the choice of measurements and configurations can be optimized to extract the most useful
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decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient
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enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by
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