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the Nanofabrication Laboratory (NFL) at ICFO. Key responsibilities: Develop and optimize dry etching processes for dielectric, semiconductor, and metallic materials. Operate and maintain ICP-RIE and RIE systems. Train
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dielectric films deposited on graphene using a non-contact microwave technique ( https://dx.doi.org/10.1021/acs.jpcb.9b11622) and monolayer graphene ( https://dx.doi.org/10.1021/acs.jpcb.9b11622 ) as a
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. For this reason, the research community working on gravitational wave detection is seeking coatings with lower thermal noise. One area of research involves replacing coatings made of amorphous dielectric materials
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, often in direct collaboration with NIST experiments. The materials systems we have studied recently include semiconductors, topological materials, 2D materials, magnetic materials, dielectrics and
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to characterize 2D materials, semiconductor devices, and biological materials from DC to the THz regime. The measurements enable the engineering of dielectric, magnetic and electrical transport properties of thin
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lithography and/or atomic layer deposition and/or gate dielectric characterization methods will be considered favorably. Dutie and Responsibilities Develop, operate, and characterize semiconductor device