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partial and total reduction processes of the films, with or without capping layers; • Performing structural and electronic characterization using X-ray diffraction and synchrotron-based experiments, in
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. The postdoctoral fellow must be familiar with the standard characterization techniques used in the group (X-ray diffraction, magnetism, EPR, NMR, UV-Vis-NIR, and infrared/Raman spectroscopy). In order to design
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, electron microscopy, X-ray diffraction, etc.). Methodology: • Design and synthesize model substrates to measure the activity of enzyme mimics. • Develop analytical methods to detect and quantify chemical
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Laser Doping or Pulsed Laser Induced Epitaxy, allowing the fabrication of ultra-doped Si:B layers, well above the B solubility limit in Si. The films will be characterized by X-Ray Diffraction
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FieldPhysicsYears of Research Experience1 - 4 Additional Information Eligibility criteria -The candidate should have demonstrated experience in the synthesis, characterization (X-ray diffraction (XRD