57 chemical-engineering "University of Sheffield " Postdoctoral positions in Netherlands
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engineering, physics or chemistry. Preference will be given to applications submitted by candidates who have received their PhD within the past five years. Additional requirements You should also have
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Position (Post-doctoral) Researcher Irène Curie Fellowship No Department(s) Biomedical Engineering Reference number V50.7534 Job description Are you inspired by the potential to use degradable
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most creative minds in physics, electrical engineering, mathematics, chemistry, mechatronics, optics, mechanical engineering, computer science, and fields which are not technical oriented. As ASML puts
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17 May 2024 Job Information Organisation/Company Delft University of Technology (TU Delft) Research Field Cultural studies Researcher Profile Recognised Researcher (R2) Country Netherlands
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TU Delft prepares its graduates for future engineering skills. Delft University of Technology (TU Delft) is looking for a post-doc researcher within the Innovation for Delft Engineering Education
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Internal Research Fellowship Opportunity in the Directorate of Technology, Engineering and Quality. ESA is an equal opportunity employer, committed to achieving diversity within the workforce and
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Vacancies Post-Doc Position on Trust and Vulnerability in Technology Contexts Key takeaways Key takeaways Are you enthusiastic about exploring the dynamics of trust and vulnerability relationships
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In the Chemical Engineering group of ENTEG at the University of Groningen, we are looking for a talented and motivated postodoctoral researcher in the field of Solid Oxide Cells as part of the HyUSE
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Postdoctoral researcher on Flexible Protonic Ceramic Fuel Cells (1.0 FTE) (V24.0342) « Back to the overview Job description In the Chemical Engineering group of ENTEG at the University of Groningen
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please use the following link: https://www.rug.nl/research/ape Qualifications Candidates should have a PhD degree in materials science and engineering. A strong background in chemical vapor deposition and