1 design-universal-"https:"-"https:"-"https:"-"https:"-"https:" PhD positions at ARCNL in Netherlands

PhD: Beyond extreme ultraviolet light source plasmas: Theory and experiment

ARCNL | Netherlands | 3 months ago

universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev