PhD-student: Nonlinear nanophotonic metasurfaces and materials for metrology

Updated: 8 days ago
Deadline: 31 May 2021

High-Harmonic Generation and EUV Science

You will perform this project in the research group Resonant Nanophotonics at AMOLF and the team of Peter Kraus at ARCNL. The research will be done in close collaboration with ASML, and targets both academic and applied breakthroughs.

 About the group and institute

This is a collaborative project between the Resonant Nanophotonics group at AMOLF, headed by Prof. Dr. Femius Koenderink and the Metrology Department at ARCNL, in particular with Dr. Peter Kraus and Prof. Dr. Arie den Boef. The research activities in the Resonant Nanophotonics group at AMOLF aim at developing nanoscale photonic structures, such as plasmonics and metasurfaces, to control scattering, emission, amplification and detection of light. The group spans the entire research cycle from developing advanced nanophotonics concepts using state of the art theory and numerical design, to nanofabrication of designed structures in the Amsterdam NanoLab cleanroom at AMOLF,  and the development of state of the art optical scatterometry and microscopy methods. The ARCNL team is expert in nonlinear optics and high-harmonic generation, computational imaging and metrology. For this project, your lab work will be primarily stationed at AMOLF, as employee of the AMOLF-ARCNL joint research programme, you will work closely with the ARCNL team, as well as with expert industrial contacts from ASML. 

 AMOLF performs leading research on the fundamental physics and design principles of natural and man-made complex matter, with research in 4 interconnected themes: nanophotonics, nanophotovoltaics, designer matter, and biophysics. AMOLF leverages these insights to create novel functional materials, and to find solutions to societal challenges in renewable energy, green ICT, and health care. AMOLF is one of the NWO-I national research institutes located at the Amsterdam Science Park, Amsterdam, The Netherlands. It has approximately 130 scientist and a total size of ca. 200 employees. Furthermore it hosts the Amsterdam NanolabNL clean room, which is part of the national NanoLabNL cleanroom network. See also

 ARCNL The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also

We are looking for an enthusiastic candidate with an MSc or equivalent degree in physics or a strongly related field. A background in optics, nanophotonics, (coherent) imaging and/or ultrafast laser physics is a clear advantage. Affinity for performing optical experiments, solve mathematical problems and working as part of a team are considered important. Candidates should have experimental skills and be able to communicate in English. The project’s results will be presented at national and international conferences and in relevant journals. The successful candidate is expected to write a PhD thesis towards the end of the 4-year project, which will be defended at the University of Amsterdam. You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination.

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