PhD-student: Next-generation sources of extreme ultraviolet light for nanolithography

Updated: 3 months ago
Deadline: 31 Dec 2022

PhD-student: Next-generation sources of extreme ultraviolet light for nanolithography
PhD-student: Next-generation sources of extreme ultraviolet light for nanolithography
Published Deadline Location
yesterday 31 Dec Amsterdam

Job description

This experimental Ph.D. project aims to design next-generation plasma sources of extreme ultraviolet (EUV) light at just 13.5nm wavelength for nanolithography. This small wavelength enables patterning of the smallest, smartest, and most energy-efficient features on microchips. EUV lithography is powered by the EUV source, where the light is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The overall efficiency in converting electrical power to EUV light is very poor: delivering a watt of EUV power at the silicon wafer level currently has a megawatt footprint. In this project, you will contribute to the team’s effort in designing more efficient and powerful laser-produced plasma sources, using advanced laser technology, through fundamental understanding of the underlying physical processes ranging from laser physics, over fluid- and plasma physics, to atomic physics.

In a team effort, in close collaboration with the ARCNL plasma theory & modeling group, you will focus on experimental studies of the fundamental processes. Using state-of-the-art wavelength laser systems, you will contribute to the continuation of Moore’s law, producing ever more powerful computer processors. You will be part of the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner, the semiconductor equipment manufacturer ASML.


Specifications
  • max. 40 hours per week
  • Amsterdam View on Google Maps

ARCNL


Requirements

You have (or nearly have) an MSc in (applied) physics. Knowledge about experimental atomic, plasma, fluid physics, or laser physics is advantageous but not required. Programming skills (in Python) are welcomed. Good verbal and written communication skills (in English) are required.


Conditions of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 1 year, with the intention to extend the contract to a total duration of four years. The gross monthly salary, based on 38 hours per week and dependent on relevant experience, will scale up during the four years from €2,539,- to €3,318,- per month according to the (CAO-OI ) and a range of employment benefits . After successful completion of the PhD research a PhD degree will be granted by the Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.


Department
EUV Plasma Processes

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl  

The research activities of the EUV Plasma Processes  group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.


Additional information

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl

Phone: +31 (0)20-851 7100
You can respond to this vacancy online via the button below.
Please annex your:
–  Resume;
–  Motivation on why you want to join the group (max. 1 page).
It is important to us to know why you want to join our team. This means that we will only consider your application if it entails your motivation letter. on.
Applications will be evaluated on a rolling basis and as soon as an excellent match is made, the position will be filled.
Online screening may be part of the selection.
Commercial activities in response to this ad are not appreciated.



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