PhD-student: Next-generation sources of extreme ultraviolet light for nanolithography

Updated: 20 days ago

This experimental Ph.D. project aims to design next-generation plasma sources of extreme ultraviolet (EUV) light at just 13.5nm wavelength for nanolithography. Using this small wavelength light, patterning of the smallest, smartest, and most energy-efficient features on microchips is enabled. EUV lithography is powered by an EUV source, where the light is produced by the interaction of high-energy CO2 -gas laser pulses with tin microdroplets. The overall efficiency of converting electrical power to EUV light is very limited: delivering just a watt of EUV power at the silicon wafer level currently has a megawatt footprint. In this project, you will contribute to the efforts of the EUV Plasma Processes team in designing more efficient and powerful laser-produced plasma sources, using advanced laser technology, through fundamental understanding of the underlying physical processes ranging from laser physics, over fluid- and plasma physics, to atomic physics.

You will be part of the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner, the semiconductor equipment manufacturer ASML. In a team effort with other PhD students and postdocs, and in close collaboration with the ARCNL plasma theory & modeling group, you will focus on experimental studies of the fundamental processes. Using state-of-the-art laser systems, you will contribute to the continuation of Moore’s law, producing ever more powerful computer processors.


About the group

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is public-private partnership with founding partners UvA, VU, NWO-I and ASML, and associate partner RUG. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl  

The research activities of the EUV Plasma Processes  group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography. The group is headed by Dr. Oscar Versolato and closely collaborates with the ARCNL research groups “Plasma Theory and Modelling” and “Ion Interactions”.


Qualifications

You have (or nearly have) an MSc in (applied) physics. Knowledge about experimental atomic, plasma, fluid physics, or laser physics is advantageous but not required. Programming skills (in Python) are welcomed. Good verbal and written communication skills (in English) are required.


Terms of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,539 per month and a range of employment benefits . After successful completion of the PhD research a PhD degree will be granted by the Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses for all new foreign students.


Contact info

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl

Phone: +31 (0)20-851 7100

You can respond to this vacancy online via the button below.
Please send you:
–  Resume;
–  Motivation on why you want to join the group (max. 1 page).

Applications will be evaluated on a rolling basis and as soon as an excellent match is made, the position will be filled.

Online screening may be part of the selection.

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