PhD-student: Modeling laser-driven plasma sources of EUV light for next-generation nanolithography

Updated: about 1 month ago
Deadline: 26 Nov 2021

Plasma Theory and Modeling

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is finalizing its buildup towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl  

The research activities of the Plasma Theory and Modeling group at ARCNL are focused on the theoretical and numerical modelling of laser-driven plasma sources of EUV light for nanolithography. Research performed by the group covers topics in non-LTE atomic kinetics & spectral modelling, plasma expansion dynamics as well as tin droplet propulsion and deformation upon laser impact.


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