PhD-student: Metasurface-based computational metrology

Updated: 6 days ago
Deadline: 05 Jul 2021

Nanoscale Imaging and Metrology

This is a collaborative project between the Resonant Nanophotonics group at AMOLF, headed by Prof. Dr. Femius Koenderink and the Metrology Department at ARCNL, in particular with Dr. Lyuba Amitonova. The research activities in the Resonant Nanophotonics group at AMOLF aim at developing nanoscale photonic structures, such as plasmonics and metasurfaces, to control scattering, emission, amplification and detection of light. The group spans the entire research cycle from developing advanced nanophotonics concepts using state of the art theory and numerical design, to nanofabrication of designed structures in the Amsterdam NanoLab cleanroom at AMOLF, and the development of state of the art optical scatterometry and microscopy methods. The ARCNL team is expert in wavefront shaping and complex scattering media for imaging and metrology. For this project, your lab work will be primarily stationed at AMOLF. As researcher in the AMOLF-ARCNL joint research programme, you will work closely with the ARCNL team, as well as with expert industrial contacts from ASML.

AMOLF performs leading research on the fundamental physics and design principles of natural and man-made complex matter, with research in 4 interconnected themes: nanophotonics, nanophotovoltaics, designer matter, and biophysics. AMOLF leverages these insights to create novel functional materials, and to find solutions to societal challenges in renewable energy, green ICT, and health care. AMOLF is one of the NWO-I national research institutes located at the Amsterdam Science Park, Amsterdam, The Netherlands. It has approximately 130 scientist and a total size of ca. 200 employees. Furthermore it hosts the Amsterdam NanolabNL clean room, which is part of the national NanoLabNL cleanroom network. See also www.amolf.nl

 ARCNL The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl


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