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solution, but the technique still has major, fundamental shortcomings. ARCNL , Delft University of Technology and ASML will join forces to get a better understanding of the causes of current limitations
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for Nanolithography (ARCNL) and the companies ASML and Delmic. About the group The Photonic Materials group (www.erbium.nl), led by Prof. Albert Polman, studies light-matter interactions at the nanoscale. The group is
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