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facilities available in the C2N cleanroom. Electron-beam lithography, laser lithography, reactive ion etching, wet chemical etching, and metal deposition techniques will be employed. - low-temperature
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activities carried out at IEMN. Carry out and monitor cleanroom fabrication steps on GaN materials and heterostructures. Contribute to optical and electron-beam lithography, metal and dielectric deposition
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criteria e-beam lithography , clean room processes (dry and wet etching , chemistry dielectric and metallic deposition), SEM observations. Optics Website for additional job details https://emploi.cnrs.fr
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microfabrication facilities, multiphoton lithography and stereolithography systems, laboratories dedicated to the development of photocrosslinkable biomaterials, advanced optical and confocal microscopy platforms
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. Where to apply Website https://emploi.cnrs.fr/Offres/CDD/UPR2940-LEIMOG-012/Default.aspx Requirements Research FieldPhysicsEducation LevelPhD or equivalent Research FieldPhysicsEducation LevelPhD
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Description of the offer : You will join the Spin Team - https://spin.ijl.cnrs.fr/- a leading team in spintronics and nanomagnetism and will participate in several research projects funded by