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activities are as follows: - investigation of plasma polymerization kinetics on model substrates; - identification of the different growth regimes; - chemical, physical, and mechanical characterization
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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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renouvelables Description de l'offre We have an opening position for a Postdoctoral Research Staff Member in the field of plasma physics. You will be integrated in a team of physicists conducting experiment
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-tube synthesis, mechanical alloying, spark plasma sintering); • Crystal structure determination and microstructural characterization (X-ray diffraction, electron microscopy, spectroscopy