CRYSTALLINE PhD position - Plasma Atomic Layer Etching of AlN and AlScN thin films for Photonics and MEMS applications (f/m/d)

19 Jan 2024
Job Information

Organisation/Company

Silicon Austria Labs

Department

Human Resources

Research Field

Engineering » Electronic engineering
Technology » Vacuum technology
Technology » Micro-technology
Physics » Surface physics
Physics » Electronics
Physics » Chemical physics
Physics » Applied physics

Researcher Profile

First Stage Researcher (R1)

Country

Austria

Application Deadline

29 Mar 2024 - 23:59 (Europe/Vienna)

Type of Contract

Temporary

Job Status

Full-time

Hours Per Week

38.5

Offer Starting Date

1 Jul 2024

Is the job funded through the EU Research Framework Programme?

HE / MSCA COFUND

Is the Job related to staff position within a Research Infrastructure?

No

Offer Description

The main objective of the PhD project is to develop a plasma ALE process for the etching of AlN and AlScN that meets the requirements for applications in quantum/nano photonics and MEMS. The idea is to find the optimal etching process and plasma parameters leading to the formation of the required profiles. The research will be carried out experimentally on industrial equipment provided by Applied Materials. As a result of the project, the developed etching process will be implemented for the fabrication of metasurface-based prototypes for quantum photonics applications.

Requirements

Research Field

All

Education Level

Master Degree or equivalent

Skills/Qualifications

• Master's degree in physics, chemistry, micro/nanotechnology or related fields.
• Advanced knowledge in plasma physics/chemistry.
• Previous experience in plasma etch/CVD and micro/nano fabrication.
• Basic knowledge of plasma diagnostics tools (OES, RFEA).
• Characterization skills in at least two of the listed instruments: SEM, AFM, ellipsometry, profilometry.
• Knowledge of surface characterization techniques are required, and knowledge of III-N materials is an advantage.
• Excellent written and oral communication skills in English.
• Enthusiasm for independent developing of new ideas and a positive attitude towards new challenges. 
• Optional: Knowledge of surface characterization techniques and III-N materials.

Languages

ENGLISH

Level

Excellent

Additional Information
Eligibility criteria

In order for a JS candidate to be eligible for CRYSTALLINE, she or he has to comply with the MSCA-COFUND Doctoral Program (DP) eligibility rules, specific CRYSTALLINE application requirements, and with fundamental ethic principles.

The MSCA-COFUND DP rules require
researchers to (i) be doctoral candidates, i.e., not already in possession of a doctoral degree at the call deadline (whereas researchers who have successfully defended their doctoral thesis but who have not yet formally been awarded the doctoral degree will not be considered eligible), and to (ii) meet the MSCA mobility rule, i.e., have not resided and/or carried out their main activity (work, studies, etc.) in Austria for more than 12 months in the 3 years immediately before the call deadline (time spent as part of a procedure for obtaining refugee status under the Geneva Convention is not taken into account).

 

The CRYSTALLINE application requirements are met if an applicant (i) holds a master’s degree in a technical discipline, (ii) provides a complete set of application documents, and (iii) complies with the submission rules for the application documents as laid out at the CRYSTALLINE website.

Work Location(s)

Number of offers available

9

Company/Institute

Silicon Austria Labs GmbH

Country

Austria

Geofield

Where to apply

Website

https://research-network.silicon-austria.com/about-crystalline/

Contact

State/Province

Steiermark

City

Graz

Website

https://silicon-austria-labs.com

Street

Sandgasse 34

Postal Code

8010

E-Mail

[email protected]

STATUS: EXPIRED