-
activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
-
the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins
-
limited, noisy, and low-resolution measurement data? In this project, you will develop a novel physics-informed machine learning approach that integrates physical simulations of the measurement process with
Searches related to plasma simulation
Enter an email to receive alerts for plasma-simulation positions