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criteria The candidate should hold a PhD in plasma physics and chemistry, materials science, surface science, polymer chemistry, or a closely related scientific field. Experience in low-pressure plasma
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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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international conferences. - PhD in plasma physics or related field. - Demonstrated knowledge of basic plasma physics. - Experience in developing analytical models and software development. - Documented
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@ensicaen.fr Requirements Research FieldChemistryEducation LevelPhD or equivalent Skills/Qualifications The candidate should hold a PhD in Materials Science, Solid-State Chemistry, Solid-State Physics, or a