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the Nuclear Energy and Fuel Cycle Division, Fusion and Fission Energy and Science Directorate at Oak Ridge National Laboratory (ORNL). The FCCI Group applies modern materials science to design, develop
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. Successful candidates must be qualified for such access without an export control license. For employment at Oak Ridge National Laboratory (ORNL), a Real ID compliant form of identification will be required
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the Materials Engineering Group within the Large Scale Structure Section, Neutron Scattering Division, Neutron Sciences Directorate at Oak Ridge National Laboratory (ORNL). The selected candidate will work in a
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are subject to performance and availability of funding. This position requires the ability to obtain and maintain an HSPD-12 PIV badge. For employment at Oak Ridge National Laboratory (ORNL), a Real ID
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) at Oak Ridge National Laboratory (ORNL). CSED focuses on transdisciplinary computational science and analytics at scale to enable scientific discovery across the physical sciences, engineered systems, and
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Division (MSTD) at Oak Ridge National Laboratory (ORNL), and who will focus on ORNL's continued development of methods to quantify shear (yield) strength of monolithic ceramic materials as a function of
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an export control license. For employment at Oak Ridge National Laboratory (ORNL), a Real ID compliant form of identification will be required. Additionally, ORNL is subject to Department of Energy (DOE
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Design Group in the Materials Science and Technology Division (MSTD), Physical Sciences Directorate (PSD) at Oak Ridge National Laboratory (ORNL). This position lives in the Alloy Behavior and Design Group
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the Materials Science and Technology Division (MSTD), Physical Sciences Directorate (PSD) at Oak Ridge National Laboratory (ORNL). The selected candidate will work with multiple other groups within MSTD
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Requirements: Security, Credentialing, and Eligibility Requirements For employment at Oak Ridge National Laboratory (ORNL), a Real ID compliant form of identification will be required. Additionally, ORNL is