Interface Engineering: Using Surface Chemistry to Impart Desired Properties

RAP opportunity at National Institute of Standards and Technology     NIST

Interface Engineering: Using Surface Chemistry to Impart Desired Properties

Location

Physical Measurement Laboratory, Nanoscale Device Characterization Division

opportunity location
50.68.03.B4752 Gaithersburg, MD 20899

NIST only participates in the February and August reviews.

Advisers
name email phone
Christina Ann Hacker [email protected] 301.975.2233
Description

Incorporation of novel materials, such as molecular layers or 2D layers, into electronic paradigms enables transformative potential in applications ranging from memory, batteries, catalysts, flexible devices, alternate computing paradigms, and quantum phenomena. In order to take advantage of the promising properties of these heterogeneous systems, holistic study of the fundamental constituents as well as their impact on the final device properties are important. As interfaces continue to dominate performance, the ability to adjust the interface for desired properties become more and more critical.  Molecular layers offer a versatile means of tuning interfacial electronic, chemical, physical, and magnetic properties. We are advancing surface characterization by using vibrational spectroscopy, photoelectron spectroscopy, contact angle, and eGaIn electrical measurements to address technology barriers which will enable successful development and subsequent manufacture of next-generation technologies.

key words

Interface Engineering; Nanofabrication; Nanotechnology; Self-assembled Monolayers; 2D Materials; Surface Chemistry; Surface Characterization; Spectroscopy; Molecular Electronics

Eligibility

Citizenship:  Open to U.S. citizens

Level:  Open to Postdoctoral applicants

Stipend
Base Stipend Travel Allotment Supplementation
$82,764.00 $3,000.00