Postdoctoral Fellow (index no. 6217-01)

The Paul Scherrer Institute PSI is the largest research institute for natural and engineering sciences within Switzerland. We perform cutting-edge research in the fields of matter and materials, energy and environment and human health. By performing fundamental and applied research, we work on sustainable solutions for major challenges facing society, science and economy. PSI is committed to the training of future generations. Therefore, about one quarter of our staff are post-docs, post-graduates or apprentices. Altogether, PSI employs 2100 people.

For the Advanced Lithography and Metrology Group  in the Laboratory for Micro and Nanotechnology  we are looking for a

Postdoctoral Fellow
for Grazing-incidence EUV wafer metrology

Your tasks

Reliable wafer metrology is a key requirement to support the semiconductor industry in the development of future technology nodes. The device size scaling driven by Moore’s law make the resolution specification for wafer metrology a moving target. The Advanced Lithography and Metrology group is dedicated to the exploration of new and alternative techniques for semiconductor metrology. Currently we are developing REGINE, a new end station for the XIL-II beamline at the SLS. REGINE is a wafer inspection microscope based on grazing-incidence coherent diffraction imaging at EUV.

Your tasks will be: 

• Support the development of the REGINE end station
• Develop Coherent Diffraction imaging algorithms and software for image reconstruction
• Explore the potential of a deep learning approach for phase retrieval from EUV diffraction data
• Perform research of highest quality and publication in high profile journals