Job Summary:
The duty of the employee will be characterization and growth thin oxide layers by ALD technique.
Job Description:
The duty of the employee will be to growth of oxide semiconductor layers by Atomic Layer Deposition method, characterization of these layers by different techniques and interpretation of received results. In particular, the layers will be optimized to achieve the different functionalities that are the subject of the project (antibacterial, self-cleaning and hardening properties ).
Considering the above mentioned tasks, previous knowledge of ALD technology and methods of characterization of thin oxide layer by solid state physics methods will be considered as mandatory.
Main research field: Physics
Sub Research Field: Solid State Physics (thin layers)
Career Stage: R2
Research Profile (details): R2
Type of Contract: Temporary (to 30 September 2023)
Status: Full-time
Salary: 6500 PLN per month (project cost).
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