The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry and is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU) and the semiconductor equipment manufacturer ASML.
The Institute of Physics (IoP) – part of the UvA’s Faculty of Science - and the Advanced Research Center for Nanolithography (ARCNL) are expanding ARCNL’s Materials Department with research on solid state theory and modelling in the form of a new research group. Our ambition is to attract top talent in the form of an ambitious and motivated scientist to a tenure-track group leader position in a stimulating environment with excellent conditions for research, tightly connected to challenging educational programmes. Our goal is to have a maximal impact on science and society.
We have a tenure track position (assistant professor) in Theory & Modelling of Materials for Nanolithography available. The successful applicant will set up a novel, independent research program with topics related to the theoretical description and modelling of the physical, chemical and mechanical behavior of high-performance materials in the context of nanolithography. The focus of this position is on realistic simulations of materials and on materials design for nanolithography, based on density functional theory (DFT), molecular dynamics (MD), and other theoretical and numerical methods.
The new group will be based in ARCNL’s new, made-to-measure laboratories, which neighbour the Faculty of Science’s new building in Amsterdam Science Park. The group leader is a staff member of ARCNL, and at the same time a full member of the Institute of Physics of the University of Amsterdam, establishing and maintaining active collaborations with research groups at ARCNL, UvA and ASML Research, with other research groups in Amsterdam, the Netherlands and abroad; the nanolithography mission of ARCNL puts emphasis on the interaction and collaboration with ASML Research. Contribution to the materials theme throughout the Amsterdam BSc and MSc curricula is also part of the job description.
Within ARCNL , the new group will be embedded in the Materials Department, where it will have ample opportunities to collaborate with the Contact Dynamics group on contact and friction mechanisms at the atomic scale (e.g. involving adhesion, tribochemistry and boundary lubrication) and with the Nanolayers group and the Materials and Surface Science for EUV Lithography group (e.g. on the surface chemical processes and plasma-surface interaction that occurs in the challenging environments of nanolithography). The design of novel thin-film materials, light-matter interaction, and surface processes occurring in reactive atmospheres, under high local mechanical forces, or under high-intensity ionizing radiation are further examples of materials research interests at ARCNL.
Amsterdam houses two global universities and the largest concentration of national research institutes in the country. Consequently, there is great potential for collaboration. For example, with
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