Postdoc: Laser-droplet interaction

This postdoc position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Dutch Top Knowledge and Innovation Covenant grant: “Determination of the state of target matter for EUV generation: advancing metrology.”

Background

Laser-produced plasmas, generated from tin targets carefully prepared by a series of laser “pre-pulses” provide the extreme ultraviolet (EUV) light that powers state-of-the-art nanolithography. The ability to shape & control these tin targets is critical for efficient EUV generation and the stability and “uptime” of EUV lithography machines. However, a large amount is still unclear about the tin target, such as how its mass is spatially distributed. Moreover, its phase, may it be liquid, gaseous, or plasma is not known.

Project goal

You will join a team of several Ph.D. students and postdocs in their quest to determine and understand the phase of the tin target matter in detail as a function of various laser parameters. This team has already completed the first experiments that indicate the tin targets’ phase using absorption imaging. You will advance the target metrology field by continuing these experiments and adding in laser-induced fluorescence and Mie scattering studies on carefully prepared targets. The experiments will enable the complete determination of the tin target mass – liquid, gas, or plasma. Regarding these experiments, you (and the rest of the team) will be responsible for both the setup, the execution, and analysis of the experiments. You will get the chance to operate ARCNL’s droplet generator setups and laser systems, and design and lead the experimental campaigns. The flexibility of the droplet generator setups and the many tools you will have at your disposal allow for creativity but also require strong experimental insight to make experiments a success. The often abundant (image) data obtained during experiments will allow you apply or develop your data analysis skills. Furthermore, in collaboration with the in-house theory group, you will develop a thorough understanding of the underlying target dynamics and its equation of state.

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is public-private partnership with founding partners UvA, VU, NWO-I and ASML, and associate partner RUG. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl  

The research activities of the EUV Plasma Processes  group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography. The group is headed by Dr. Oscar Versolato and closely collaborates with the ARCNL research groups “Plasma Theory and Modelling” and “Ion Interactions”.

You have (or soon will have) PhD in (applied) physics. Knowledge about experimental atomic, plasma, fluid physics, or laser physics is advantageous. Programming skills (Python) are welcomed. Good verbal and written communication skills (in English) are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the maximum duration of three years, with a salary in scale 10 (CAO-OI ) and a range of employment benefits . ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: [email protected]
Phone: +31 (0)20-851 7100

You can respond to this vacancy online via the button below.
Please send your:
–  Resume;
–  Motivation on why you want to join the group (max. 1 page).

Applications will be evaluated on a rolling basis and as soon as an excellent match is made, the position will be filled.

Online screening may be part of the selection.

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