Beamline / Project / Activity description
In order to allow the laboratory to remain competitive in the next 20 years, an entirely new source - Elettra 2.0 - belonging to the new generation of storage rings (DLSR or Diffraction Limited Storage Ring) is being developed. The new source will exhibit a major increase in the brilliance and coherence fraction of the photon beams. The Elettra 2.0 optics is based on our enhanced symmetric six bend achromat structure (S6BA-E) with a 12-fold symmetry and an emittance of 200 pm-rad at 2.4 GeV. The new structure creates also straight sections in the arcs permitting the installation of additional insertion devices, thus increasing the number of beamlines. Existing beamlines will have to be upgraded and new beamlines developed to take full advantage of the characteristics of Elettra 2.0. Additionally, three in-vacuum undulators and two high-field superbends are considered. The new machine is scheduled for commissioning in the second half of 2026.
Job description
the successful candidates, as part of the Optics Group, will be involved in the optimization of the optical systems of the existing beamlies and in the design and implementation of the new beamlines for the Elettra 2.0 source. In particular, the successful candidates are expected to take part in the conceptual design and simulations of the optics of the new beamlines, work on the optomechanical design of beamline components, and contribute to the thermal and vibrational analysis of the optomechanical components in collaboration with the mechanical engineering team. They will also participate in the assembling, alignment, optical characterization and commissioning of the main optical components such as mirrors, monochromators, etc.
The appointment envisioned is a fixed term contract with an initial duration of 24 months. The salary will be commensurate with the previous experience and qualifications of the candidate. Applications should include full curriculum vitae and contact information (including electronic mail) of at least three reference
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