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. Investigating the etching mechanisms and selectivity of InP and InGaAlAs films as a function of plasma parameters using ellipsometry, XPS and AFM. 2. Developing an etching process for the multilayer stack meeting
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, AFM, ellipsometry, or TEM will be considered an asset. The successful candidate should also demonstrate: - strong experimental skills; - the ability to independently design and conduct experiments
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departments dedicated to research in condensed matter physics and chemistry. Its multidisciplinary character is reflected in activities covering spin electronics, magnetism, ultrafast optics, electron
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empirical analyses (task 21) - Contribution to WP5: Theoretical and practical outputs • Contribution to the theoretical outputs: creation of a theoretical model that reflects private judicial, legal and