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heterostructures. Preparation and deterministic assembly of two-dimensional materials. Nanofabrication using electron-beam lithography and related cleanroom techniques. Electrical and quantum-transport measurements
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a state-of-the-art 4” processing line for III-V semiconductors, including an ASML DUV scanner, AIXTRON MOCVD G10 epitaxy reactor, electron beam lithography, diverse plasma etching tools, wafer-level
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, electron-beam/cathodoluminescence experiments, EUV emission measurements, detector calibration, data analysis, and project reporting. The successful candidate will contribute to cutting-edge research in EUV
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. in Physics, Materials Science, Electrical Engineering, or a related field by the start date. Preferred Qualifications: Hands-on experience in nanofabrication techniques (e.g., electron-beam lithography