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ambitious researcher looking for your next challenge? Do you have a background in dielectric ceramic processing, characterisation, and energy storage materials? Do you want to further your career in one
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interface materials or related technology Optimization of formulation for gap fill dielectrics in heterogenous integration Contribute to ongoing semiconductor research Collaborate with faculty and other
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simulation tools. Designing and evaluating surfaces and/or dielectric matching layers to improve magnetic coupling Evaluating electromagnetic shielding performance and electromagnetic field safety compliance
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breakthrough Ultralow-K (ULK) Monolayer Amorphous Carbon (MAC) dielectric technology. Having successfully validated the core materials physics at the lab scale, we are now solving critical reactor scaling
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gate dielectrics, including recipe development, precursor evaluation, and post-deposition treatments. • Design, fabricate, and characterize short-channel OS transistors targeting sub-100 nm channel
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in Computational Electromagnetics will be responsible for developing theoretical models and high-performance computer codes for modelling the interaction between electromagnetic waves and dielectric
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low-temperature Cu/dielectric hybrid bonding for fine-pitch, high-density interconnects by developing and validating a new flow with reliable dielectric sealing under ≤200 °C. The role integrates materials
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of plasmonic materials, namely thin films containing plasmonic nanoparticles (NPs) of noble metals embedded in a dielectric matrix, with graphene or graphene quantum dots. These materials enable
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the electrospinning technique, as well as their structural, microstructural, chemical, dielectric, and magnetic characterization, among others. As indicated below, applicants must identify the research grant for which