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@TU/e cleanroom facility (http://www.tue.nl/nanolab ), which hosts a state-of-the-art 4” processing line for III-V semiconductors, including an ASML DUV scanner, AIXTRON MOCVD G10 epitaxy reactor
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between the Dutch Research Council (NWO), the University of Amsterdam (UvA), Vrije Universiteit Amsterdam (VU), the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is
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with our industry partner ASML—the major player in the semiconductor lithography sector—to harness new techniques in nonlinear optics in gas-filled fibres to develop light sources with unique properties
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