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Required Knowledge, Skills, and Abilities: PhD in radiochemistry, nuclear chemistry, inorganic chemistry or a closely related field Candidates of Chemistry or Physics majors should have experience and
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of organic-inorganic hybrid thin films and their applications as next-generation extreme ultraviolet lithography (EUVL) photoresists. You will explore atomic layer deposition (ALD) techniques, including vapor
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post PHD Experience with handling radioactivity Experience with target design, inorganic radiochemical separations of irradiated targets Practice with nuclear cross-section measurements and decay
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-based nanostructures, nanoparticle functionalization and inorganic templating, and characterization of resulting structures via biochemical methods, electronic testing, optical spectroscopy, electron