Sort by
Refine Your Search
-
Listed
-
Category
-
Program
-
Field
-
degree in physics, chemistry, or materials science or equivalent, to satisfy the Dutch university requirement to enter a PhD program. Previous experience with lasers is not required but it would be a plus
-
of semiconductor devices. Friction-induced stresses and deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature
-
/341467/internship-shaping-laser-induced-tin… Contact City Amsterdam Website https://arcnl.nl/ Street Science Park 106 Postal Code 1098 XG STATUS: EXPIRED
-
industry and science – a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The use
-
surfaces in plasma is unknown, limiting the impact of plasma catalysis by inhibiting the design of dedicated plasma catalysts. This PhD position links surface science and plasma catalysis, aiming
-
Research Infrastructure? No Offer Description Work Activities Surface reactions live in plasma environment This postdoc position connects the two active research fields of surface science and plasma
-
collaborate with researchers from Computational Imaging, EUV Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers
-
on thermodynamic, electrochemical, and mechanical stability. Qualifications You have (or soon will have) a MSc degree in physics, chemistry, or materials science or equivalent to satisfy the Dutch university
-
Universiteit Amsterdam (VU) en de fabrikant van halfgeleiderapparatuur ASML. ARCNL is gevestigd op het Amsterdam Science Park en heeft ongeveer 100 medewerkers. Zie ook www.arcnl.nl Je zal deel uitmaken van een
-
catalysis by inhibiting the design of dedicated plasma catalysts. This PhD position links surface science and plasma catalysis, aiming to understand the active state of a surface live during plasma exposure