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chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique methodology developed by our research group. It is part of a fully funded Starting Grant from
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and metrology is considered an advantage for the project. Work environment The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current
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on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research
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. This postdoc position connects the two active research fields of surface science and plasma chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique
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at the Dutch semiconductor manufacturing equipment company ASML. About the group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and