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currently funded in this field: the ERC Pho-T-Lyze project [4] and the FET OPEN Terameasure project [5]. In parallel, a technology for manufacturing coplanar tips for characterizing electronic components
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developing high-performance materials, manufacturing processes and products. By developing specific computer-aided technologies, we accelerate materials based innovation including the digitalization
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Wafer Grinding research activities Chemical Mechanical Polishing (CMP) is an enabling technology for the nanoelectronics industry. CMP uses a chemical formulation that contains abrasive nanoparticles
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and competence in artificial intelligence, autonomous systems and software for the benefit of Swedish industry. Read more: https://wasp-sweden.org/ The graduate school within WASP is dedicated
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The electrification of fossil- fuel based processes in industry and transport requires new materials that can store and transduce electrical energy. Electrocatalytic and (photo)electrocatalytic materials offer a great
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of academia and industry. This objective is achieved by: The performance of an individual research project under the direction of an internationally renowned Group Leader, in a creative and stimulating