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to work independently and proactively with minimum supervision Collaborative and capable of working in multi-disciplinary environment Deadline- and results-oriented Ability to work well under pressure Full
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independently and proactively with minimum supervision Collaborative and capable of working in multi-disciplinary environment Deadline- and results-oriented Ability to work well under pressure Full fluency in
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part of a vibrant research environment, using state-of-the-art instrumentation to perform your own and collaborative research on EUV photoresists towards sub-10 nm patterning. Your tasks will be
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