-
high-resolution angle-resolved photoemission spectroscopy (ARPES). Other complementary physical characterization techniques like elastic recoil detection analysis (ERDA), atomic force microscopy (AFM
-
metals will be at the core of this project. Various deposition techniques such as Molecular Beam Epitaxy, Physical Vapor Deposition and Atomic Layer Deposition will be used to research the ideal
-
field effects transistors (CMOSFET) [2]. The use of atomic thick material comes with new challenges. The bond free surfaces challenge the gate dielectric deposition process with classical techniques. Also
-
) and atomically thin complementary FETs (CFETs). (Fig1.) What you will do In this PhD research project, you will explore the nucleation and growth behavior of TMDCs with monolayer thickness control by
-
Research Infrastructure? No Offer Description Join an international and multidisciplinary research team to explore and manipulate three-atom-thin semiconductors at the forefront of semiconductor technology