Sort by
Refine Your Search
-
Listed
-
Category
-
Employer
- Ghent University
- KU Leuven
- University of Antwerp
- Vrije Universiteit Brussel
- IMEC
- VIB
- imec
- University of Liege
- Université catholique de Louvain
- Free University of Brussels
- Ghent University - Photonics Research Group
- Hasselt University
- KU Leuven (Coordinator)
- KU Leuven/BioTeC+ (Chemical & Biochemical Process Technology & Control)
- Siemens
- Université de Namur
- Vlaams Instituut voor de Zee
- 7 more »
- « less
-
Field
-
CMOS technologies and you will contribute towards their evaluation and benchmarking, optimizing design and block level aspects to fully utilize future technologies. What you will do You evaluate through
-
Is the Job related to staff position within a Research Infrastructure? No Offer Description What you will do You evaluate through physical design experiments the impact of various technology options
-
is to offer and deliver cutting-edge research, provide top-notch designs and developments on power electronics, powertrains and smart green energy solutions with intelligent control systems
-
deliver cutting-edge research, provide top-notch designs and developments on power electronics, powertrains and smart green energy solutions with intelligent control systems for tomorrow's mobility
-
PhD Scholarship in Design optimizer tool and predictive control system of a Megawatt Charging System
deliver cutting-edge research, provide top-notch designs and developments on power electronics, powertrains and smart green energy solutions with intelligent control systems for tomorrow's mobility
-
in the role of design media in architectural practice, the shift from representation to simulation, from drawing to image. The project aims to expanding the architectural image production with time
-
systems designs is more than ever essential to maintain performance increase together with power/area reduction in the next generations of chips. The Back-End-Of-Line (BEOL) interconnects is the metal
-
to polish wafers to remove unwanted dielectric or metallic material and planarize its surface. As feature scaling in IC manufacturing continues, chemical and design-related device failure phenomena like
-
advances, the optimization of technology together with circuits and systems designs is more than ever essential to maintain performance increase together with power/area reduction in the next generations of
-
Department: Faculty of Design Sciences Regime Full-time Let’s shape the future - University of Antwerp The University of Antwerp is a dynamic, forward-thinking, European university. We offer