Advanced characterization of ultrathin inorganic materials with X-ray fluorescence H/F

Advanced characterization of ultrathin inorganic materials with X-ray fluorescence H/F

To develop and share X-ray fluorescence quantitative elemental analysis methodologies of ultra-thin inorganic materials to accelerate the development of advanced material processes. The following contributions will be extensively investigated: instrumental (from TXRF and GIXRF to XRF, using EDXRF and WDXRF detection and state of the art tools with multiple anodes), modeling (spectra-based FP-EDXRF) and calibration strategies.

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Description du poste :

XRF methodologies will be specifically dedicated to : 

1/ ultrathin mono-element La and Al layers integrated in 10 nm CMOS gate stack 

2/ the thin layers (5-50 nm) of perovskite structure oxides (lanthanum nickelate, La2NiO4) and fluorite (zirconia stabilized with yttrium oxide and cerium oxide doped with gadolinium) developed by the LMGP for memory applications (OxRAM)

3/ ultra-thin layers of lamellar sulphides synthesized and studied at LMGP (GaxS, TixS) and at Leti (2D materials).

•PhD degree in materials science, physics, chemistry or related field.

• Good writing skills, ability to publish and promote your research

• Excellent communication, organizational skills and managerial ability for the project

• Proactive, creative, independent and highly-motivated candidate

• Interpersonal skills, problem-solving, initiative, rigor and teamwork abilities

Please send motivation letter, CV, list of publications and contact details of two referees to

  Emmanuel Nolot, CEA-LETI ([email protected]);

  Monica Burriel, LMGP ([email protected])

  Delphine Boutry, CEA-LETI ([email protected])

  Hubert Renevier, LMGP ([email protected]) 

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